Social Implementation and Future Prospects of Nanoimprint Lithography: Efforts to Overcome Release Issues and Compete with EUVL in Next-Generation Semiconductor Fine Processing Technology
¥62 ,500This publication discusses the mechanisms of nanoimprint lithography, various initiatives aimed at semiconductor fine processing applications, the development and practical implementation of equipment, and prospects for device applications. It also evaluates the release issues associated with nanoimprint lithography and presents strategies to address them, alongside an overview of domestic and international trends and future outlooks.